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Bibliography for Aluminum as a High Performance Ultra High Vacuum Chamber Material

Aluminum UHV Bibliography

Aluminum Beam Tube Chambers

Aluminum Ultra High Vacuum:

Ultimate Pressure of the Order of 10 -13 Torr in an Aluminum Alloy Vacuum Chamber   Hajime Ishimaru, Journal of Vacuum Science Technology A 7(3),   2439-2442 1989

Thermal out Gassing of Aluminum Alloy Vacuum Chambers    R. Chen, K. Nanushima, H. Ishimaru; Journal of Vacuum Science Technology A 3(6), 2188-2191 (1985).

Correlation of Outgassing of Stainless Steel and Aluminum    F. Dylla, D. M. Manos and P. H. LaMarche, Journal of Vacuum Science Technology A 11(5), 2623-2636 (1993).

Handbook of Vacuum Technology, Modern Methods and Techniques Section 4.5.6 Aluminum Based Vacuum Systems  (Contributing author James Garner, SMC Technology No publisher info avaiable: Aluminum Based Vacuum Systems. Handbook of Vacuum Technology.   ed. Hoffman, Thomas and Singh.   Academic Press, Harcourt Brace and Company, (1997). )

 

Synchrotron Radiation:

Outgassing from Aluminum Surface Layer Induced by Synchrotron Radiation   Ota, K Kanazawa, M. Kobayahi, & H. Ishimaru; American Vacuum Society (1996).

 

Auger Electron Spectroscopy Characterization of Aluminum Alloy Exposed to Synchrotron Radiation   T. Momose, K. Asano, N. Ohta, Y. Kanda. and  H. Ishimaru. American Vacuum Society (1994).

Photon Stimulated Desorption Measurement of an Extruded Aluminum Beam Chamber for the Advanced Photon Source  C.L. Foerster and C. Lanni BNL, J.R. Noonan and Rosenberg American Vacuum Society (1996).

Low Contamination Ultrahigh Vacuum System of the Synchrotron Radiation Research Center 1.3 GeV Electron Storage Ring G.Y. Hsiung, J.R. Huang, D.J. Wang, J.G. Shyy, J.C Lee, R.J. Sheu, H.S. Tzeng, S.N. Hsu, S.Y. Perng, K.M. Hsiao, W.D. Wey, J.R. Chen, and Y.C. Liu American Vacuum Society (1995).

 

Effective Environmentally Friendly UHV Cleaning for Aluminum:

Tests of an Environmental and Personnel Safe Cleaning Process for Brookhaven National Laboratory and Storage Ring Components C.L. Foerster C. Lani and R. Lee BNL  and G. Mitchell and W. Quade at Dow Chemical Cleaning Systems.  JVST A15(3) May/June (1997)

X-Ray Photoelectron Spectroscopy analysis of aluminum and copper cleaning procedures for the Advanced Photon Source   R.A. Rosenberg, M.W. McDowell, and J.R. Noonan, JVST A12(4), Jul/Aug (1994).

 

THINK IN ALUMINUM

 

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